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AS ISO 17560-2006

Surface chemical analysis - Secondary-ion mass spectrometry - Method for depth profiling of boron in silicon

Standards Australia, 10/20/2006

Publisher: AS

File Format: PDF

$24.00$48.12


Published:20/10/2006

Pages:10

File Size:1 file , 770 KB

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Adopts ISO 17560:2002 to specify a secondary-ion mass spectrometric method using magnetic-sector or quadrupole mass spectrometers for depth profiling of boron in silicon and using stylus profilometry or optical interferometry for depth scale calibration.

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