• ASTM F2113-01(2007)

ASTM F2113-01(2007)

Standard Guide for Analysis and Reporting the Impurity Content and Grade of High Purity Metallic Sputtering Targets for Electronic Thin Film Applications

ASTM International, 06/01/2007

Publisher: ASTM

File Format: PDF

$25.00$50.00


Published:01/06/2007

Pages:2

File Size:1 file , 60 KB

Note:This product is unavailable in Russia, Ukraine, Belarus

1.1 This guide covers sputtering targets used as thin film source material in fabricating semiconductor electronic devices. It should be used to develop target specifications for specific materials and should be referenced therein.

1.2 This standard sets purity grade levels, analytical methods and impurity content reporting method and format.

1.2.1 The grade designation is a measure of total metallic impurity content. The grade designation does not necessarily indicate suitability for a particular application because factors other than total metallic impurity may influence performance.

More ASTM standard pdf

ASTM D1418-10a(2016)

ASTM D1418-10a(2016)

Standard Practice for Rubber and Rubber Latices-Nomenclature

$25.00 $50.00

ASTM F2446-04

ASTM F2446-04

Standard Classification for Hierarchy of Equipment Identifiers and Boundaries for Reliability, Availability, and Maintainability (RAM) Performance Data Exchange

$41.00 $83.00

ASTM A289/A289M-97(2013)

ASTM A289/A289M-97(2013)

Standard Specification for Alloy Steel Forgings for Nonmagnetic Retaining Rings for Generators

$26.00 $52.00

ASTM B564-18

ASTM B564-18

Standard Specification for Nickel Alloy Forgings

$34.00 $69.00