Your shopping cart is empty!
ASTM International, 06/10/2001
Publisher: ASTM
File Format: PDF
$25.00$50.00
Published:10/06/2001
Pages:2
File Size:1 file , 38 KB
Note:This product is unavailable in Russia, Ukraine, Belarus
1.1 This guide covers sputtering targets used as thin film source material in fabricating semiconductor electronic devices. It should be used to develop target specifications for specific materials and should be referenced therein.
1.2 This standard sets purity grade levels, analytical methods and impurity content reporting method and format.
1.2.1 The grade designation is a measure of total metallic impurity content. The grade designation does not necessarily indicate suitability for a particular application because factors other than total metallic impurity may influence performance.
Standard Test Method for Determination of Hydrocarbons and Non-Hydrocarbon Gases in Gaseous Mixtures by Gas Chromatography
$28.00 $57.00
Standard Specification for Ferrocolumbium
$25.00 $50.00
Standard Practice for Professional Certification Performance Testing
$24.00 $48.00
Standard Test Methods for Measurement of Tensile Strength or Bond Strength of Portland Cement-Based Plaster by Direct Tension
$32.00 $65.00
